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Natnael Masresha Zerihun

Optical Profilometry of RF MEMS Structures

Department of Microsystems, USN · Norway · 2024/2025 · Academic project · Group of 4

White-light interferometric metrology of RF MEMS switch structures with a Veeco Wyko NT9100, resolving sub-nanometer surface roughness.

  • Interferometry
  • Metrology
  • RF MEMS
  • Surface roughness

Overview

Dimensional and roughness metrology of provided RF MEMS switch structures using phase-shifting and vertical-scanning interferometry, benchmarked against optical microscopy.

Technical approach

  • Veeco Wyko NT9100 optical profilometer in PSI mode for smooth surfaces and VSI mode for taller steps
  • Stitched full-sample topography plus local roughness maps
  • Cross-checked lateral dimensions against calibrated optical microscopy

Results

  • Measured 0.42 nm surface roughness on gold transmission lines (PSI), 0.9 nm on the switch bridge, and 6.2 nm on the silicon substrate
  • Extracted feature dimensions and step heights across the structures

Media

Color-coded surface roughness map with statistics panel
Roughness map of the switch bridge measured in PSI mode: 0.90 nm average roughness over a 58 x 54 um field.
Interferometer view with fringes on an RF MEMS bridge
Live interferogram during measurement; fringes reveal the curvature of the released bridge.
Interferometer view of the RF MEMS switch area
Positioning the measurement field on the switch structure.